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Publication
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Title of Article |
Effect of Substrate Surface Roughening on the Capacitance and Cycling Stability of Ni(OH)2 Nanoarray Films |
Date of Acceptance |
23 October 2019 |
Journal |
Title of Journal |
Scientific Reports |
Standard |
SCOPUS |
Institute of Journal |
Springer Nature Limited |
ISBN/ISSN |
ISSN 2045-2322 |
Volume |
9 |
Issue |
9 |
Month |
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Year of Publication |
2019 |
Page |
16877 |
Abstract |
The effect of substrate surface roughening on the capacitance of Ni(OH)2/NiOOH nanowall array samples produced via chemical bath deposition for 2, 4, 6, 24 and 48 h on an as-received stainless steel substrate and the same substrate after sandblasting has been investigated. Symmetric cells were subjected to 120,000 charge-discharge cycles to access changes in their capacitance. Specific capacitances were derived from cyclic voltammetry and charge-discharge cycling under a three electrode setup. Substrate roughening significantly increases the capacitance of symmetric cells and film stability since film exfoliation does not occur to the same degree as on the as-received substrate. Interestingly, films deposited on a roughened substrate for 6, 24 and 48 h also exhibit self-recovery of capacitance, which could be related to an electrodissolution-electrodeposition effect. With the use of a roughened substrate, the thinnest film gives the highest specific capacitance, 1456 F g−1, whilst the thickest one shows the highest areal capacitance, 235 mF cm−2, after 20,000 cycles. These results reveal the promise of surface roughening toward increasing the capacitance and stability of Ni(OH)2/NiOOH films. |
Keyword |
Ni(OH)2 , nanowall , supercapacitor, substrate roughness |
Author |
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Reviewing Status |
มีผู้ประเมินอิสระ |
Status |
ตีพิมพ์แล้ว |
Level of Publication |
นานาชาติ |
citation |
false |
Part of thesis |
true |
Attach file |
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Citation |
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