| Title of Article |
Spectroscopic Analyses of Sputtered Aluminum Oxide Films with Oxygen Plasma Treatments. |
| Date of Acceptance |
18 September 2018 |
| Journal |
| Title of Journal |
Materials Science Forum |
| Standard |
SCOPUS |
| Institute of Journal |
Science and Engineering Institute (SCIEI) |
| ISBN/ISSN |
doi:10.4028/www.scientific.net/MSF.947.96 |
| Volume |
2018 |
| Issue |
947 |
| Month |
|
| Year of Publication |
2018 |
| Page |
96-100 |
| Abstract |
X-ray photoelectron spectroscopy (XPS) and Spectroscopic Ellipsometry (SE) were used
to analyse the effect of oxygen plasma treatment on properties of aluminum oxide thin films. The
aluminum oxide films were fabricated using a reactive sputtering system. The as-deposited films
were treated with oxygen plasma powered by an RF generator. During the plasma treatment, the
pressures were set at 1 x 10-1
to 1x 10-2 mbar, while the RF supplied powers at 100 W and 200 W. It
was observed that lower plasma powers and higher pressures resulted in smoother films. The O/Al
ratio of the films were found to decrease with increasing plasma powers and pressures. The
thickness and refractive index of the films were significantly affected by the oxygen plasma
treatment process, which could be related to the change in films’ packing density and the etching at
the surface.
|
| Keyword |
Aluminium Oxide, Thin Film, Plasma Treatment |
| Author |
|
| Reviewing Status |
มีผู้ประเมินอิสระ |
| Status |
ตีพิมพ์แล้ว |
| Level of Publication |
นานาชาติ |
| citation |
true |
| Part of thesis |
true |
| Attach file |
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| Citation |
0
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Publication
Journal Publication
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