2012 ©
             Publication
Journal Publication
Title of Article Confined-Chalcogenide Phase-Change Memory with Thin Metal Interlayer for Low Reset Current by Finite Element Modeling  
Date of Acceptance 16 September 2008 
Journal
     Title of Journal Solid State Phenomena 
     Standard  
     Institute of Journal Trans Tech Publications, Switzerland 
     ISBN/ISSN 1662-9779  
     Volume 2009 
     Issue 152-153 
     Month
     Year of Publication 2009 
     Page 399-402 
     Abstract This paper reports on the confined-chalcogenide phase change memory with thin metal interlayer (CCTMI) with the operating reset current of 0.6mA-30ns. This cell offers low reset current with simple architecture and fabrication. Thermal and heat flux distribution of both the normal-bottom-contact (NBC) and a proposed CCTMI PCM cells were carefully analyzed and simulated by two-dimensional finite element modeling. It is intriguingly found that the reset operation current of the CCTMI cell is 44% lower than that of the NBC. CCTMI has capability to solve an over-programming fail issue due to confined heat dissipation in active area. 
     Keyword Phase change memory (PCM), Confined-chalcogenide phase change memory with thin metal interlayer (CCTMI), Normal bottom contact (NBC), Low reset current, Finite element. 
Author
507040015-7 Mr. SANCHAI HARNSOONGNOEN [Main Author]
Engineering Doctoral Degree

Reviewing Status มีผู้ประเมินอิสระ 
Status ตีพิมพ์แล้ว 
Level of Publication นานาชาติ 
citation false 
Part of thesis true 
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